>> Tungsten

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  Tungsten target for electrochromic glass

  Paramater Manufacturing Range (Tungsten Planar Sputtering Target) Rectangle Length (mm) Width (mm) Thickness(mm) Custom Made 10 – 3000 10 – 800 1.0 – 50.8 Circular Diameter (mm) Thickness (mm) 10 – 1000 1.0 – 100

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  Non-Sag Tungsten Weight

  Specification Product Name Non-Sag tungsten weight Material Pure tungsten  Standard ASTM B760 Processing Sintering, Rolling, Forging, machining Density 19.2 g/cm3 Dimension Range Minimum size: thickness:3mm width:3mm length:3mm Maximum size:customized

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  Tungsten Weight

  Specification Product Name  tungsten weight  Material Pure tungsten  Standard ASTM B760 Processing Sintering, Rolling, Forging, machining Density 19.2 g/cm3 Dimension Range Minimum size: thickness:3mm width:3mm length:3mm Maximum size:customized

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  Counterweight

  Specification Product Name  tungsten weight Material Pure tungsten  Standard ASTM B760 Processing Sintering, Rolling, Forging, machining Density 19.2 g/cm3 Dimension Range Minimum size: thickness:3mm width:3mm length:3mm Maximum size:customized

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  Tungsten Cathode and anode

  Parameters Electrochemical Performance

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  Tungsten Heating elements

  Parameters Sapphire crystal growth furnace thermal field: large size manufacturing capacity.  Diameter Length Purity Density Service temp Vapor pressure blackness Coefficient of thermal expansion 3-100mm 3~3000mm 99.95% 19.2g/cm3 min. 3400 ℃  10-6 Pa 0.295 4.98*10-6