Molybdenum Planar Sputtering Targets

Material:

Molybdenum

Shape:

Plate

Purity:

99.5%

Density:

10.2g/cm³

Color:

Silver

Standard:

ASTM B386

Size:

Cusomized

Surface:

Bright

High Light:

99.95% Molybdenum Sputtering Target

Molybdenum Sputtering Target 10.2g/Cm3

Molybdenum Plate 10.2g/Cm3

Molybdenum  Sputtering Target Description

In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, electrodes and wiring materials for thin film solar cells and barrier layer materials for semiconductors. These are based on molybdenum's high melting point, high electrical conductivity, low specific impedance, good corrosion resistance and good environmental properties.

Parameters

Manufacturing Range(Molybdenum rotary sputtering targets)

OD(mm)

ID(mm)

Length(mm)

Custom made

Φ140-180mm

Φ125-Φ135mm

100-3300

Manufacturing Range (Molybdenum Planar Sputtering Target)

Rectangle

Length (mm)

Width (mm)

Thickness(mm)

Custom Made

10 - 3000

10 - 800

1.0 - 50.8

Circular

Diameter (mm)

Thickness (mm)

10 - 1000

1.0 - 100

Specification

Composition

Mo (Mo1, TZM)

Purity

    ≥99.95%

Density

10.2 g/cm3

Grain Sizes

    ≤ 100 µm2 or on request

Roughness

Ra≤0.4μm

Flatness tolerance

<4um

Atomic number 42
CAS number 7439-98-7
Atomic mass 95.94 [g/mol]
Melting point 2620 °C
Boiling point 4639 °C
Density at 20 °C 10.22 [g/cm³]
Crystal structure Body-centered cubic
Coefficient of linear thermal expansion at 20 °C 5.2 × 10-6 [m/(mK)]
Thermal conductivity at 20 °C 142 [W/(mK)]
Specific heat at 20 °C 0.25 [J/(gK)]
Electrical conductivity at 20 °C 17.9 × 106 [S/m]
Specific electrical resistance at 20 °C 0.056 [(Ωmm2)/m]

Quality&Inspection

Applications:

Thin-film solar industry, solar cells, surface engineering

Touch control industry, flat panel displays

Semiconductor industry, microelectronics, automotive lights and decorative coating,

Coated glass industry(including architectural glass, automotive glass, optical glass and other films), etc.

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